| Reactor | Quartz tube |
|---|---|
| Graphite susceptor | |
| Sample size | Max. 4inch single wafer |
| Furnace | Hot wall resistance heater |
|
3-Zone heating control (Uniform zone: 300mm) |
|
| Max. Temp.: 1,000℃ | |
| Mounting position movable | |
| Horizontally opened furnace | |
|
RF plasma (option) |
Adjustable distance between working coil and sample |
| Gas | Gas leak detection module |
| Base pressure | 9x10-4 Torr |
| Operating pressure | Up to several hundred mmTorr |
| Pumping | Scroll pump (80m3/h)+ Booster pump(500m3/h) |